The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2025
Filed:
Apr. 26, 2022
Lawrence Livermore National Security, Llc, Livermore, CA (US);
Bryan D. Moran, Pleasanton, CA (US);
Brian J. Bauman, Pleasanton, CA (US);
Lawrence Livermore National Security, LLC, Livermore, CA (US);
Abstract
The present disclosure relates to a system for performing scanning projection stereolithography. The system uses a light projector which is configured to generate a polymerizing optical signal to initiate polymerization of a photopolymerizable resin or material at a build plane. An optics subsystem collimates and focuses the polymerizing optical signal. The optics subsystem is movable relative to the build plane to optimize focus of the polymerizing optical signal at the build plane. A light scanning subsystem directs the polymerizing optical signal received from the optics subsystem to selected X axis and Y axis locations on the build plane. A positioning subsystem positions the optics subsystem at a selected location relative to the build plane, where the selected location is chosen to optimize focusing of the polymerizing optical signal at a specific, selected X/Y location on the build plane.