The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2025

Filed:

Apr. 20, 2022
Applicant:

North Carolina State University, Raleigh, NC (US);

Inventor:

Salah M. Bedair, Raleigh, NC (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 31/00 (2006.01); H10H 20/01 (2025.01); H10H 20/812 (2025.01); H10H 20/815 (2025.01); H10H 20/816 (2025.01); H10H 20/825 (2025.01);
U.S. Cl.
CPC ...
H10H 20/815 (2025.01); H10H 20/01335 (2025.01); H10H 20/812 (2025.01); H10H 20/8162 (2025.01); H10H 20/825 (2025.01);
Abstract

Various examples are provided related to InGaN-relaxed templates. In one example, a device structure includes a GaN layer; and a semibulk template comprising a plurality of stacked periods on the GaN layer. Each period can include a layer of InGaN and a GaN interlayer disposed on the layer of InGaN, where a thickness of the GaN interlayer of a top period of the stacked periods is greater than a thickness of the GaN interlayer of a bottom period disposed on the GaN layer. In another example, a method includes forming a GaN layer and forming a semibulk template including a plurality of stacked periods on the GaN layer. Each period can include a layer of InGaN and a GaN interlayer disposed on the layer of InGaN, where a thickness of the GaN interlayer of the top period is greater than the GaN interlayer of the bottom period.


Find Patent Forward Citations

Bedair, Salah. (2025). Indium gallium nitride (ingan) relaxed templates employed as a substrate for nitride-based devices and related methods (U.S. Patent No. 12396295). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12396295

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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