The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2025

Filed:

Apr. 26, 2022
Applicant:

Device Co., Ltd., Cheonan-si, KR;

Inventor:

Taek Youb Lee, Chungcheongnam-do, KR;

Assignee:

DEVICE CO., LTD., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 3/06 (2006.01);
U.S. Cl.
CPC ...
H05K 3/068 (2013.01); H05K 3/067 (2013.01); H05K 2203/086 (2013.01); H05K 2203/1509 (2013.01); H05K 2203/1554 (2013.01);
Abstract

The present invention relates to a substrate edge etching apparatus including: a substrate support assembly having a horizontally rotatable chuck base, chuck pins disposed on top of the chuck base to support a substrate, a purge gas inlet hole extending from an underside center of the chuck base to an interior of the chuck base in an upward and downward direction thereof, and a purge gas outlet hole extending radially from the purge gas inlet hole and then extending upwardly to penetrate top of the chuck base; a purge gas supply assembly for supplying a purge gas to the purge gas inlet hole; a chemical liquid supply unit for supplying a chemical liquid to top of the substrate; a bowl assembly having bowls surrounding the periphery of the substrate support assembly and configured to be able to ascend and descend; and a fan filter unit spaced apart from top of the substrate support assembly.


Find Patent Forward Citations

Quick Actions:

Lee, Taek. (2025). Device for etching the periphery edge of a substrate and method for controlling etching thereof (U.S. Patent No. 12396103). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12396103

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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