The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2025

Filed:

Dec. 20, 2022
Applicant:

Dkk Company, Limited, Tokyo, JP;

Inventors:

Tanan Hongnara, Tokyo, JP;

Takayoshi Sasaki, Tokyo, JP;

Yoshiki Shirasawa, Tokyo, JP;

Hitoshi Onoda, Tokyo, JP;

Katsumori Sasaki, Tokyo, JP;

Keisuke Sato, Tokyo, JP;

Ichiro Oshima, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04B 7/145 (2006.01); H01Q 15/14 (2006.01);
U.S. Cl.
CPC ...
H04B 7/145 (2013.01); H01Q 15/147 (2013.01);
Abstract

Provided is a reflect array that enables reflectance at a plurality of angles of incidence while maintaining a high gain without causing a decrease in the electric field intensity of a reflector plate, and that can simplify the installation of the reflect array. In the reflect array, a plurality of first elements and a plurality of second elements are arranged on XY plane. The first elements are arranged in Y direction to form a first row of elements. The second elements are arranged in Y direction to form a second row of elements. The first element rows and the second element rows are alternately arranged in X direction. The two angles of maximum reflectance are on the same positive or negative side of X-axis.


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