The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2025
Filed:
Mar. 04, 2022
Applicant:
3m Innovative Properties Company, St. Paul, MN (US);
Inventors:
Dipankar Ghosh, Oakdale, MN (US);
Weigang Lin, Shanghai, CN;
Jie Huang, Shanghai, CN;
Min Ding, Shanghai, CN;
Wei Li, Shanghai, CN;
Kun Wang, Shanghai, CN;
Assignee:
3M Innovative Properties Company, St. Paul, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 17/00 (2006.01); H01Q 1/24 (2006.01); H01Q 1/42 (2006.01);
U.S. Cl.
CPC ...
H01Q 17/007 (2013.01); H01Q 1/243 (2013.01); H01Q 1/422 (2013.01);
Abstract
Anti-reflective assemblies comprise: a high dielectric permittivity substrate comprising a ceramic and a nonporous multilayer anti-reflective film contacting or adhesively bonded to the substrate. The nonporous multilayer anti-reflective film comprises sequential first, second, and third layers of sequentially decreasing dielectric permittivity. Each layer comprises a respective polymer matrix and filler particles.