The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2025
Filed:
Jul. 25, 2022
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Varun Sharma, Helsinki, FI;
Michael Givens, Oud-Heverlee, BE;
Assignee:
ASM IP HOLDING B.V., Almere, NL;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); H01L 21/02049 (2013.01); H01L 21/02178 (2013.01); H01L 21/31111 (2013.01); H01L 21/31116 (2013.01); H01L 21/31122 (2013.01); H01L 21/67017 (2013.01); H01L 21/67063 (2013.01); H01L 21/67069 (2013.01);
Abstract
The present disclosure is directed to methods in situ generation of a hydrogen halide for use in an etching process for selective etching of a material from other(s) on a surface layer of a substrate, to methods of etching utilizing the in situ generated hydrogen halide, and to systems carrying the out the disclosed processes.