The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2025

Filed:

Jan. 26, 2022
Applicant:

Shanghai United Imaging Healthcare Co., Ltd., Shanghai, CN;

Inventors:

Yanfang Liu, Shanghai, CN;

Li Wang, Shanghai, CN;

Cheng Ni, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/06 (2006.01); A61N 5/01 (2006.01); A61N 5/10 (2006.01); G21K 1/02 (2006.01); A61N 7/00 (2006.01);
U.S. Cl.
CPC ...
G21K 1/02 (2013.01); A61N 5/1045 (2013.01);
Abstract

The present disclosure relates to a radiation treatment system. The radiation treatment system may include an MLC having at least one layer of leaves and at least one block. Each of the at least one layer of leaves may include a first group of leaves and a second group of leaves. At least a portion of the leaves may be movable to block pathways of a first portion of the radiation beams within a radiation area. A second portion of the radiation beams may be incident at a treatment region of the radiation treatment system. The MLC may be situated in a first plane. The at least one block may be situated in a second plane different from the first plane. The at least one block may be configured to shield at least a portion of leaking radiation beams within an end area.


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