The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2025

Filed:

Apr. 11, 2019
Applicant:

Emc Ip Holding Company Llc, Hopkinton, MA (US);

Inventors:

Sanping Li, Beijing, CN;

Kun Wang, Beijing, CN;

Assignee:

EMC IP Holding Company LLC, Hopkinton, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06N 3/08 (2023.01); G06N 3/04 (2023.01);
U.S. Cl.
CPC ...
G06N 3/08 (2013.01); G06N 3/04 (2013.01);
Abstract

According to an embodiment, a performance benchmark database is obtained, where the performance benchmark database at least includes structural data of one or more deep neural network models, time performance data and computing resource consumption data of a plurality of deep learning applications based on the one or more deep neural network models; a training dataset is extracted based on the performance benchmark database, where the training dataset has a plurality of parameter dimensions, the plurality of parameter dimensions including: structures of deep neural network models of the plurality of deep learning applications, resource configuration of the plurality of deep learning applications, and training time of the plurality of deep learning applications; and correspondence among the parameter dimensions of the training dataset is created so as to create an estimation model for estimating resources utilized by deep learning applications.


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