The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2025
Filed:
Oct. 15, 2024
Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, CN;
Abstract
The present invention relates to a method for calibrating computer-generated hologram substrate errors based on a ray propagation in three-dimensional model, which belongs to the application of holography in optical measurement. The calibration method mainly includes the following two steps: firstly, establishing a corresponding ray propagation in three-dimensional model according to an aspheric interference optical path with a computer-generated hologram; then, obtaining data of the shapes of the front and the rear surfaces and the thickness uniformity of the computer-generated hologram through a multi-surface measurement technology; and finally, calculating the substrate error of the computer-generated hologram by combining the ray propagation in three-dimensional model and the measurement data. Compared with the prior art, the present invention establishes a complete ray propagation in three-dimensional model in the aspheric interference measurement optical path to achieve the high-accuracy calibration of the computer-generated hologram substrate errors and improve the surface interference measurement accuracy with computer-generated hologram.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile