The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2025
Filed:
Apr. 05, 2023
Canon Kabushiki Kaisha, Tokyo, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An exposure apparatus that performs an exposure operation of exposing a substrate via a projection optical system is provided. The apparatus includes a temperature regulator configured to regulate a temperature distribution on an optical element of the projection optical system, and a controller configured to perform, in an exposure operation period in which the exposure operation is executed, a first process of controlling the temperature regulator so as to reduce a change of aberration of the projection optical system caused by execution of the exposure operation. In accordance with detection of a predetermined event before the exposure operation period, the controller performs, before performing the first process, a second process for reducing the aberration of the projection optical system using a method different from the first process.