The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2025
Filed:
Jun. 02, 2021
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventors:
Kenta Yamazaki, Shizuoka, JP;
Toshihide Aoshima, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/037 (2006.01); G03F 7/004 (2006.01); G03F 7/033 (2006.01); H01L 23/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/037 (2013.01); G03F 7/0045 (2013.01); G03F 7/033 (2013.01); H01L 24/19 (2013.01); H01L 24/20 (2013.01); G03F 7/2006 (2013.01); H01L 2224/214 (2013.01); H01L 2224/215 (2013.01); H01L 2924/07025 (2013.01);
Abstract
There is provided a pattern forming method that includes an exposure step of exposing a photosensitive film to laser light; and a development step of developing the photosensitive film after the exposure to obtain a pattern, where the photosensitive film contains at least one precursor selected from the group consisting of a polyimide precursor and a polybenzoxazole precursor, and an onium salt.