The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2025
Filed:
Mar. 09, 2021
Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;
Ryo Haseyama, Osaka, JP;
Manabu Orita, Osaka, JP;
Toshimi Nishiyama, Osaka, JP;
Atsushi Ashino, Osaka, JP;
Abstract
A beam intensity uniformizing element includes an optical base, a first lens array disposed at a front surface of the optical base; and a second lens array disposed at a back surface of the optical base. The first lens array includes first mold lens cells arranged in different directions along the front surface of the optical base. The first mold lens cells have surfaces constituting the front surface of the optical base. The surfaces of the first mold lens cells have first linear marks thereon extending in a first direction. The second lens array includes second mold lens cells arranged in different directions along the back surface of the optical base. The second mold lens cells have surfaces constituting the back surface of the optical base. The surfaces of the second mold lens cells have second linear marks thereon extending in a second direction different from the first direction. This element suppresses generation of an interference pattern and reduces cost.