The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2025

Filed:

Jun. 16, 2022
Applicant:

Guangzhou Tyrafos Semiconductor Technologies Co., Ltd., Guangzhou, CN;

Inventors:

Jun-Wen Chung, Tainan, TW;

Hsu-Wen Fu, Kaohsiung, TW;

Lu-Lang Hsu, Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/18 (2006.01); G02B 27/42 (2006.01); G01S 7/481 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1866 (2013.01); G02B 27/4272 (2013.01); G01S 7/4814 (2013.01);
Abstract

A surface light source projection device with improved zero-order diffraction includes a light exit module and a diffractive optical module. The diffractive optical module has two micron diffraction layers, the micron diffraction layers include a plurality of microstructures. Each of the microstructures has a circular perimeter and is provided with a recess having an opening inside the circular perimeter. The outer diameter of each of the microstructures is between 5 times and 200 times the incident wavelength of an incident light beam, and the outer diameter of the recess is between 0.3 and 0.7 times the outer diameter of each microstructure.


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