The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2025
Filed:
Mar. 30, 2022
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Uihyoung Lee, Hwaseong-si, KR;
Suji Gim, Hwaseong-si, KR;
Hongsik Park, Suwon-si, KR;
Taeheon Lee, Hwaseong-si, KR;
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/76 (2006.01); B01D 45/16 (2006.01); B01D 53/38 (2006.01); B04C 5/085 (2006.01); B04C 5/15 (2006.01); B04C 5/185 (2006.01); B04C 9/00 (2006.01); C23C 16/44 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B01D 53/76 (2013.01); B01D 45/16 (2013.01); B01D 53/38 (2013.01); B04C 5/085 (2013.01); B04C 5/15 (2013.01); B04C 5/185 (2013.01); B04C 9/00 (2013.01); H01J 37/32844 (2013.01); H01L 21/67017 (2013.01); B01D 2258/0216 (2013.01); B04C 2009/008 (2013.01); C23C 16/4412 (2013.01); H01L 21/67063 (2013.01);
Abstract
An apparatus for trapping an exhaust material from a substrate-processing process includes: a cyclone configured to provide the exhaust material with a swirling flow, wherein the exhaust material is discharged from the substrate-processing process using a reaction gas; an atomization module for providing the cyclone with a mist to convert the exhaust material into a powder through a wet oxidation reaction; and a collector configured to collect the powder.