The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2025

Filed:

Apr. 10, 2024
Applicant:

Semiconductor Energy Laboratory Co., Ltd., Atsugi, JP;

Inventors:

Shunpei Yamazaki, Setagaya, JP;

Jun Koyama, Sagamihara, JP;

Hiroyuki Miyake, Atsugi, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 27/12 (2006.01); H01L 29/04 (2006.01); H10D 30/67 (2025.01); H10D 62/40 (2025.01); H10D 62/80 (2025.01); H10D 84/84 (2025.01); H10D 86/01 (2025.01); H10D 86/40 (2025.01); H10D 86/60 (2025.01);
U.S. Cl.
CPC ...
H10D 86/60 (2025.01); H10D 30/6732 (2025.01); H10D 30/6745 (2025.01); H10D 30/6746 (2025.01); H10D 30/6755 (2025.01); H10D 30/6756 (2025.01); H10D 30/6757 (2025.01); H10D 62/405 (2025.01); H10D 62/80 (2025.01); H10D 84/84 (2025.01); H10D 86/0221 (2025.01); H10D 86/0231 (2025.01); H10D 86/423 (2025.01); H10D 86/471 (2025.01); H01L 21/02603 (2013.01); H01L 2924/13069 (2013.01); H10D 30/6739 (2025.01); H10D 62/40 (2025.01);
Abstract

An oxide semiconductor layer which is intrinsic or substantially intrinsic and includes a crystalline region in a surface portion of the oxide semiconductor layer is used for the transistors. An intrinsic or substantially intrinsic semiconductor from which an impurity which is to be an electron donor (donor) is removed from an oxide semiconductor and which has a larger energy gap than a silicon semiconductor is used. Electrical characteristics of the transistors can be controlled by controlling the potential of a pair of conductive films which are provided on opposite sides from each other with respect to the oxide semiconductor layer, each with an insulating film arranged therebetween, so that the position of a channel formed in the oxide semiconductor layer is determined.


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