The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2025

Filed:

Aug. 25, 2023
Applicant:

Guangzhou Tyrafos Semiconductor Technologies Co., Ltd., Guangzhou, CN;

Inventors:

Ping-Hung Yin, Hsinchu, TW;

Yung-Ming Chou, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 23/741 (2023.01); H04N 23/71 (2023.01); H04N 23/73 (2023.01); H04N 23/76 (2023.01); H04N 25/58 (2023.01);
U.S. Cl.
CPC ...
H04N 23/741 (2023.01); H04N 23/73 (2023.01); H04N 23/76 (2023.01); H04N 25/58 (2023.01); H04N 23/71 (2023.01);
Abstract

The present invention relates to a dynamic image generating method and a dynamic image sensor thereof. The dynamic image sensor includes a first exposure pixel, a second exposure pixel and an image processing module. The dynamic image sensor applies the dynamic image generating method, which generates the default short-exposure image signal by exposing the first exposure pixel for default short-exposure time, and exposing the second exposure pixel for default long-exposure time to generate the default long-exposure image signal. The image processing module confirms whether the default short-exposure image and the default long-exposure image signals are between the lower and upper limits of pinching. If so, the optimal short-exposure time and the optimal long-exposure time are generated; otherwise, increase the default short-exposure time by a short-exposure fixed value or decrease the default long-exposure time by a long-exposure fixed value, and repeat until the optimal short-exposure and long-exposure times are obtained.


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