The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2025
Filed:
Jan. 25, 2021
Deuve Photonics, Inc., Sahuarita, AZ (US);
Chris Hessenius, Sahuarita, AZ (US);
Mahmoud Fallahi, Sahuarita, AZ (US);
DEUVE PHOTONICS, INC., Sahuarita, AZ (US);
Abstract
The present invention describes a laser system for eliminating astigmatism to produce an elliptical laser beam that has an ellipticity between about 0.9 to 1.0. The laser system described herein allows for increased conversion efficiency and output powers. on-linear optical elements in the laser system eliminate astigmatism. The laser system comprises one or more cavities with wavelength splitters that act as dual-mirror chambers for single-pass light transmission through the non-linear optical elements to reduce cavity size or as beam splitters for double-pass light transmission through the non-linear optical elements to increase laser output power. The laser system may also include a birefringent filter and/or etalon in the first cavity for polarization and wavelength tuning. The laser system may also generate a high-power, deep-ultraviolet laser output. The laser system may also be devoid of curved mirrors and non-normal incidence reflection to eliminate astigmatism.