The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2025
Filed:
Oct. 26, 2021
Applicant:
Psk Inc., Gyeonggi-do, KR;
Inventors:
Ho Jae Sim, Gyeonggi-do, KR;
Hyeong Shin Cho, Gyeonggi-do, KR;
Assignee:
PSK INC., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 37/20 (2006.01); H01L 21/311 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32385 (2013.01); H01J 37/20 (2013.01); H01L 21/31116 (2013.01); H01L 21/68742 (2013.01);
Abstract
The present invention provides a support unit included in an apparatus for treating a substrate by using plasma. The support unit may include: a chuck configured to support a lower surface of the substrate; a moving plate provided to surround the chuck when viewed from above; and a lifting member configured to change an exposed area of an edge region of the substrate supported by the chuck for the treating space by relatively moving the moving plate in an upper or lower direction with respect to the chuck.