The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2025

Filed:

Dec. 09, 2022
Applicant:

Lexisnexis Risk Solutions FL Inc., Boca Raton, FL (US);

Inventor:

Victor Palmer, Denver, CO (US);

Assignee:

LexisNexis Risk Solutions FL Inc., Boca Raton, FL (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/70 (2017.01); G06T 3/40 (2006.01); G06V 10/25 (2022.01); G06V 10/74 (2022.01);
U.S. Cl.
CPC ...
G06T 7/70 (2017.01); G06T 3/40 (2013.01); G06V 10/25 (2022.01); G06V 10/761 (2022.01);
Abstract

Embodiments of the disclosed technology are directed to using pixel data from two or images of the same real-world region to determine the orientation of substantially planar surfaces in those images. The disclosed technology may be utilized to generate positions and/or orientations of planar surfaces based on multiple 2D images of the planar surface. Implementations can include modeling a planar surface, which can include capturing at least two images (from corresponding different, known positions), determining, from the images, regions that correspond to substantially the same portion of the real-world planar surface, computing a similarity metric for the two regions, and then determining the orientation of the planar surface based on maximizing the similarity metric over various different regions from the images. The described embodiments provide improvements in speed and accuracy compared to existing procedures and are able to find planar surfaces in both low-texture environments and occluded environments.


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