The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2025
Filed:
Mar. 16, 2022
Tism Co., Ltd., Kasugai, JP;
TISM CO., LTD., Kasugai, JP;
Abstract
By a program executed by a CPU, a determination is made as to whether a direction in which a next stitch is to be formed belongs to a predetermined area corresponding to a hitch stitch, and upon determination that the direction in which the next stitch is to be formed belongs to the predetermined area, detour control is performed which includes moving a holding member, holding a sewing workpiece, so as to detour an upper thread, extending downward from a sewing needle, in a direction corresponding to a perfect stitch and then further moving the holding member to a target position corresponding to the next stitch. Various conditions for the detour control are variably set via an operation panel and a program executed by the CPU. Such variable setting can be done by user's operations via the operation panel, by setting detour-controlling data, and/or the like.