The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2025
Filed:
Mar. 14, 2022
Applicant:
Kioxia Corporation, Tokyo, JP;
Inventor:
Fumiki Aiso, Kuwana, JP;
Assignee:
Kioxia Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01L 21/02 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/45527 (2013.01); H01L 21/02178 (2013.01); H01L 21/0228 (2013.01); H01L 21/28568 (2013.01);
Abstract
A semiconductor manufacturing apparatus according to the present embodiment includes a chamber on which a substrate is placed, a first gas flow path configured to supply a first processing gas into the chamber, a second gas flow path configured to supply a second processing gas into the chamber, a first replacement gas flow path configured to supply a first replacement gas into the chamber, a replacement gas heating unit configured to heat the first replacement gas, a second replacement gas flow path configured to supply a second replacement gas into the chamber, and a replacement gas cooling unit configured to cool the second replacement gas.