The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2025

Filed:

Nov. 10, 2020
Applicant:

Dyson Technology Limited, Wiltshire, GB;

Inventors:

Michael Edward Rendall, Newbury, GB;

Robert Ian Joseph Gruar, Swindon, GB;

Assignee:

Dyson Technology Limited, Wiltshire, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/02 (2006.01); C23C 14/35 (2006.01); C23C 14/50 (2006.01); C23C 14/54 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/02 (2013.01); C23C 14/351 (2013.01); C23C 14/50 (2013.01); C23C 14/54 (2013.01); H01J 37/32733 (2013.01); H01J 37/3277 (2013.01); H01J 37/3405 (2013.01); H01J 37/3417 (2013.01); H01J 37/3452 (2013.01);
Abstract

Certain examples described herein relate to a sputter deposition apparatus including a guiding member to guide a substrate in a conveyance direction, a plasma source to generate a plasma, and a magnet arrangement. The magnet arrangement is configured to confine the plasma within the apparatus to a pre-treatment zone, within which the substrate is exposed to the plasma in use. The magnet arrangement is also configured to confine the plasma within the apparatus to a sputter deposition zone, located after the pre-treatment zone in the conveyance direction, to provide for sputter deposition of a target material to the substrate in use. The pre-treatment and sputter deposition zones are disposed about the guiding member.


Find Patent Forward Citations

Quick Actions:

Rendall, Michael. (2025). Sputter deposition apparatus and method (U.S. Patent No. 12385123). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12385123

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…