The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2025

Filed:

Apr. 30, 2020
Applicant:

Daan Gene Co., Ltd., Guangdong, CN;

Inventors:

Xiwen Jiang, Guangdong, CN;

Aishan Liu, Guangdong, CN;

Assignee:

DAAN GENE CO., LTD., Guangdong, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12N 9/12 (2006.01);
U.S. Cl.
CPC ...
C12N 9/1252 (2013.01); C12Y 207/07007 (2013.01);
Abstract

The present invention provides a heat-resistant DNA polymerase mutant with high amplification activity. Particularly, the present invention uses protein directed evolution technology to construct a random mutation library for the polymerase active domain of Taq enzyme, and gradually adds screening pressure, so that unsuitable mutations will be eliminated naturally, and mutations with dominant traits will gradually accumulate. Finally, a series of amino acid sites and their mutations that are critical to Taq enzyme amplification and polymerization performance will be selected, and a Taq enzyme mutant with high amplification activity will be obtained.


Find Patent Forward Citations

Jiang, Xiwen. (2025). Heat-resistant dna polymerase mutant with high amplification activity (U.S. Patent No. 12385021). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12385021

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…