The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2025

Filed:

Apr. 10, 2020
Applicants:

Kobe Steel, Ltd., Hyogo, JP;

National University Corporation Tokai National Higher Education and Research System, Aichi, JP;

Inventors:

Norihide Maeda, Kobe, JP;

Akira Kishimoto, Kobe, JP;

Ken Nakanishi, Kobe, JP;

Hiroshi Machida, Aichi, JP;

Tsuyoshi Yamaguchi, Aichi, JP;

Koyo Norinaga, Aichi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/14 (2006.01); B01D 19/00 (2006.01); B01D 53/18 (2006.01); B01D 53/50 (2006.01); B01D 53/62 (2006.01); B01D 53/96 (2006.01);
U.S. Cl.
CPC ...
B01D 53/1425 (2013.01); B01D 19/0005 (2013.01); B01D 53/1418 (2013.01); B01D 53/1475 (2013.01); B01D 53/1481 (2013.01); B01D 53/18 (2013.01); B01D 53/507 (2013.01); B01D 53/62 (2013.01); B01D 53/96 (2013.01); B01D 2252/20421 (2013.01); B01D 2257/302 (2013.01); B01D 2257/504 (2013.01);
Abstract

An aspect of the present invention is a gas treatment method including: an absorption step of bringing a gas to be treated, which contains carbon dioxide and a sulfur compound, into contact with an absorption liquid to be phase-separated by carbon dioxide absorption, to cause the absorption liquid to absorb the carbon dioxide and the sulfur compound; and a first release step of heating the absorption liquid brought into contact with the gas to be treated to a temperature equal to or higher than a temperature at which the carbon dioxide absorbed by the absorption liquid is released from the absorption liquid and lower than a temperature at which the sulfur compound absorbed by the absorption liquid is released from the absorption liquid, to release the carbon dioxide from the absorption liquid.


Find Patent Forward Citations

Maeda, Norihide. (2025). Gas treatment method, and gas treatment device (U.S. Patent No. 12383861). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12383861

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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