The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2025
Filed:
Apr. 20, 2021
Ascend Performance Materials Operations Llc, Houston, TX (US);
Vikram Gopal, The Woodlands, TX (US);
Wai-Shing Yung, Pensacola, FL (US);
Natasha Dean, Houston, TX (US);
Albert Ortega, Pensacola, FL (US);
Ascend Performance Materials Operations LLC, Houston, TX (US);
Abstract
A filter or mask structure, comprising a first face layer comprising a polymer and having a face basis weight, a second outer layer comprising a polymer and having an outer basis weight less than 34 gsm, and a third outer layer comprising a polymer and having a third basis weight and disposed between the first face layer and the second outer layer. At least one of the layers further comprises an AM/AV compound. The mask structure demonstrates anefficacy log reduction greater than 4.0, as measured in accordance with ASTM E3160 (2018) and a particulate filtration efficiency greater than 90%, as measured in accordance with ASTM F2299-03R17.