The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2025

Filed:

Mar. 30, 2022
Applicant:

Asm Ip Holding, B.v., Almere, NL;

Inventor:

Timothee Blanquart, Oud-Heverlee, BE;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); C23C 16/08 (2006.01); C23C 16/18 (2006.01); C23C 16/455 (2006.01); H01J 37/32 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28562 (2013.01); C23C 16/045 (2013.01); C23C 16/45538 (2013.01); H01J 37/32082 (2013.01); H01J 37/3244 (2013.01); H01L 21/28568 (2013.01); C23C 16/08 (2013.01); C23C 16/18 (2013.01); H01J 2237/332 (2013.01);
Abstract

Methods and related systems for filling a gap feature comprised in a substrate are disclosed. The methods comprise a step of providing a substrate comprising one or more gap features into a reaction chamber. The one or more gap features comprise a proximal part comprising a proximal surface and a distal part comprising a distal surface. The methods further comprise a step of subjecting the substrate to a plasma treatment. Thus the proximal surface is inhibited while leaving the distal surface substantially unaffected. Then, the methods comprise a step of selectively depositing a metal- and nitrogen-containing material on the distal surface.


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