The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2025
Filed:
May. 04, 2021
Applicant:
Jusung Engineering Co., Ltd., Gwangju-si, KR;
Inventors:
Min Ho Cheon, Gwangju-si, KR;
Chul Joo Hwang, Gwangju-si, KR;
Assignee:
JUSUNG ENGINEERING CO., LTD., , KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32568 (2013.01); H01J 37/32165 (2013.01); H01J 37/3244 (2013.01); H01J 37/32541 (2013.01); H01J 37/32577 (2013.01); H01J 37/32715 (2013.01); H01J 2237/332 (2013.01); H01J 2237/334 (2013.01);
Abstract
The present inventive concept relates to a substrate processing apparatus comprising: a chamber; a substrate support part which supports one or more substrates in the chamber; an upper electrode which is disposed above and arranged opposite to the substrate support part; and a lower electrode which is disposed below and spaced apart from the upper electrode, wherein the lower electrode includes a first electrode to which first RF power having a first frequency is applied and a second electrode to which second RF power having a second frequency different from the first frequency is applied.