The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2025

Filed:

Jun. 03, 2022
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Sangbong Lee, Suwon-si, KR;

Hoyeon Kim, Suwon-si, KR;

Soonwoo Kwon, Suwon-si, KR;

Yongyi Kim, Suwon-si, KR;

Jaesik Kim, Suwon-si, KR;

Kyuyoung Lee, Suwon-si, KR;

Jongsu Lee, Suwon-si, KR;

Juha Lee, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/16 (2006.01); H04M 1/02 (2006.01);
U.S. Cl.
CPC ...
G06F 1/1656 (2013.01); G06F 1/1652 (2013.01); G06F 1/1681 (2013.01); H04M 1/0216 (2013.01); H04M 1/0268 (2013.01); H04M 2201/38 (2013.01);
Abstract

According to various embodiments, an electronic device may include: a first housing, a second housing foldably connected to the first housing through a hinge, and a flexible display supported by the first housing and the second housing, the flexible display including a window layer having a first surface and a second surface facing a direction opposite to the first surface, and including a glass layer, and a display panel corresponding to the second surface under the window layer, wherein the glass layer includes a plurality of first patterns on the first surface, a surface of the plurality of first patterns being lower than the first surface, and a plurality of second patterns on the second surface, a surface of the plurality of second patterns being lower than the second surface, and a first etching amount per unit area of the plurality of first patterns and a second etching amount per the unit area of the plurality of second patterns are different.


Find Patent Forward Citations

Loading…