The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2025
Filed:
Sep. 22, 2022
Canon Kabushiki Kaisha, Tokyo, JP;
Rika Hoshino, Tochigi, JP;
Kazuhiro Takahashi, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus, which is configured to expose a substrate to light using an original in which a pattern is formed, includes an illumination optical system configured to guide exposure light to the original, the exposure light including first exposure light with a first wavelength and second exposure light with a second wavelength that is different from the first wavelength, an optical projection system that exhibits on-axis chromatic aberration and that is configured to form a pattern image of the original at a plurality of positions in an optical axis direction of the optical projection system using the exposure light, and a control unit configured to expose the substrate to light while scanning the substrate in a state where a normal direction of a surface of the substrate is inclined with respect to the optical axis direction of the optical projection system.