The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2025
Filed:
Aug. 19, 2021
Applicant:
Waseda University, Tokyo, JP;
Inventors:
Assignee:
WASEDA UNIVERSITY, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/18 (2006.01); C30B 29/04 (2006.01);
U.S. Cl.
CPC ...
C30B 25/18 (2013.01); C30B 29/04 (2013.01);
Abstract
A stack includes: a ruthenium film; and a diamond film that is an epitaxial film formed on the ruthenium film, wherein a crystal plane of a surface of the ruthenium film is a (0001) plane, and a crystal plane of a surface of the diamond film is a (111) plane. A method of manufacturing a stack includes: a step of forming a ruthenium film; and a step of heteroepitaxially growing a diamond film on the ruthenium film, wherein a (111) plane of the diamond film is heteroepitaxially grown on a (0001) plane of the ruthenium film.