The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2025
Filed:
Nov. 21, 2023
Chongqing Huapu Information Technology Co., Ltd., Chongqing, CN;
Chongqing Huapu Quantum Technology Co., Ltd., Chongqing, CN;
Chongqing Huapu New Energy Co., Ltd., Chongqing, CN;
Chongqing Menghe Biotechnology Co., Ltd., Chongqing, CN;
Yunnan Huapu Quantum Material Co., Ltd, Yunnan, CN;
Roi Optoelectronics Technology Co, Ltd., Shanghai, CN;
Guangdong Roi Optoelectronics Technology Co., Ltd., Guangdong, CN;
Chongqing Institute of East China Normal University, Chongqing, CN;
East China Normal University, Shanghai, CN;
CHONGQING HUAPU INFORMATION TECHNOLOGY CO., LTD., Chongqing, CN;
CHONGQING HUAPU QUANTUM TECHNOLOGY CO., LTD., Chongqing, CN;
CHONGQING HUAPU NEW ENERGY CO., LTD., Chongqing, CN;
CHONGQING MENGHE BIOTECHNOLOGY CO., LTD., Chongqing, CN;
YUNNAN HUAPU QUANTUM MATERIAL CO., LTD, Yunnan, CN;
ROI OPTOELECTRONICS TECHNOLOGY CO, LTD., Shanghai, CN;
GUANGDONG ROI OPTOELECTRONICS TECHNOLOGY CO., LTD., Guangdong, CN;
CHONGQING INSTITUTE OF EAST CHINA NORMAL UNIVERSITY, Chongqing, CN;
EAST CHINA NORMAL UNIVERSITY, Shanghai, CN;
Abstract
A pulsed laser deposition method is provided. The method includes emitting a plurality of groups of femtosecond pulses, focusing the plurality of groups of femtosecond pulses into a plurality of groups of femtosecond filaments by lenses, and cross-coupling the plurality of groups of femtosecond filaments to form n beams of plasma gratings; exciting a target material by using a first plasma grating; and adjusting angles of the lenses and time delay between a plurality of beams of femtosecond pulses; coupling and splicing a second plasma grating with the first plasma grating along a grating pattern of the first plasma grating, until a nplasma grating is coupled and spliced with a (n−1)plasma grating along a grating pattern of the (n−1)plasma grating to form a plasma grating channel; and exciting the target material by using the plasma grating channel to complete deposition on a substrate.