The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2025
Filed:
Aug. 13, 2021
Applicant:
Mitsubishi Chemical Corporation, Tokyo, JP;
Inventor:
Tomohiro Kusano, Tokyo, JP;
Assignee:
Mitsubishi Chemical Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C11D 3/33 (2006.01); H01L 21/304 (2006.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
C11D 3/33 (2013.01); H01L 21/304 (2013.01); H01L 21/3212 (2013.01); C11D 2111/22 (2024.01);
Abstract
The present invention relates to a cleaning solution for removing a cerium compound, a cleaning method, and a method for producing a semiconductor wafer. An object of the present invention is to provide a cleaning solution having excellent removability of a cerium compound. The cleaning solution for removing a cerium compound of the present invention contains an aminopolycarboxylic acid compound having a coordination number of 7 or more.