The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2025

Filed:

Mar. 30, 2022
Applicant:

Mitsubishi Chemical Corporation, Tokyo, JP;

Inventors:

Masayasu Hasuike, Tokyo, JP;

Nao Yamasue, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L 71/00 (2006.01); B29C 64/118 (2017.01); B29C 64/209 (2017.01); B29K 71/00 (2006.01); B29K 81/00 (2006.01); B33Y 30/00 (2015.01); B33Y 70/00 (2020.01); C08J 5/24 (2006.01); C08L 81/06 (2006.01);
U.S. Cl.
CPC ...
C08L 71/00 (2013.01); B29C 64/118 (2017.08); B29C 64/209 (2017.08); B33Y 30/00 (2014.12); B33Y 70/00 (2014.12); C08J 5/24 (2013.01); C08L 81/06 (2013.01); B29K 2071/00 (2013.01); B29K 2081/06 (2013.01);
Abstract

A resin composition with high heat resistance, melt formability, and secondary processability is provided. A resin composition containing: a poly(aryl ether ketone) resin (A); and a poly(ether imide sulfone) resin (B), wherein the poly(aryl ether ketone) resin (A) and the poly(ether imide sulfone) resin (B) are compatibly mixed. The poly(aryl ether ketone) resin (A) is preferably a poly(ether ketone ketone) resin with a repeating unit (a-1) represented by the following formula (1A) and a repeating unit (a-2) represented by the following formula (2A), and the resin composition has one glass transition temperature.


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