The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2025

Filed:

Jun. 04, 2024
Applicant:

Clo Virtual Fashion Inc., Seoul, KR;

Inventors:

Hyung Gi Ham, Seoul, KR;

Jae Hwan Ma, Seoul, KR;

Tae Wan Jeong, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A41H 3/00 (2006.01); G06T 19/20 (2011.01);
U.S. Cl.
CPC ...
A41H 3/007 (2013.01); G06T 19/20 (2013.01); G06T 2219/2024 (2013.01);
Abstract

The following disclosure relates to a pattern creation simulation method. The pattern creation simulation method may provide a user interface including a first area that controls a plurality of functions for creating or editing a design of a design product in a three-dimensional (3D) virtual space and a second area in which a plurality of interfaces are switched in response to the plurality of functions.


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