The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 29, 2025

Filed:

Nov. 04, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Michael Mason Carrell, Leander, TX (US);

Jason M. Schaller, Austin, TX (US);

Victor Flores Iracheta, Prosper, TX (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); C23C 14/48 (2006.01); C23C 14/56 (2006.01); H01J 37/317 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); C23C 14/48 (2013.01); C23C 14/566 (2013.01); H01J 37/3171 (2013.01); H01L 21/67201 (2013.01); H01J 2237/201 (2013.01); H01J 2237/204 (2013.01);
Abstract

An ion implantation system including an ion source for generating an ion beam, an end station containing a platen for supporting a substrate to be implanted by the ion beam, and a load lock disposed adjacent the end station and adapted to transfer substrates between an external environment and the end station. The load lock may include a transfer chamber having a hollow interior, a first isolation door affixed to a first side of the transfer chamber and openable to the external environment, a second isolation door affixed to a second side of the transfer chamber and openable to an interior of the end station, and a volume filling cassette disposed within the hollow interior of the transfer chamber and adapted to hold at least one substrate.


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