The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2025
Filed:
Sep. 25, 2019
Applicant:
Leica Microsystems Cms Gmbh, Wetzlar, DE;
Inventors:
Frank Sieckmann, Eppingen, DE;
Constantin Kappel, Schriesheim, DE;
Assignee:
LEICA MICROSYSTEMS CMS GMBH, Wetzlar, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06V 20/69 (2022.01); G02B 21/36 (2006.01); G05B 17/02 (2006.01); G06F 18/20 (2023.01); G06F 18/214 (2023.01); G06F 18/2431 (2023.01); G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G06V 20/698 (2022.01); G02B 21/365 (2013.01); G06F 18/214 (2023.01); G06F 18/2431 (2023.01); G06F 18/285 (2023.01); G06N 20/00 (2019.01);
Abstract
A method for optimizing a workflow of at least one microscope or microscope system includes a step a) of implementing a workflow by one or more components of at least one microscope and/or microscope system, wherein the workflow comprises a capture of first data. In a step b), a trained model is determined for the workflow, at least in part based on the captured first data.