The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2025
Filed:
Nov. 08, 2024
Shandong University, Jinan, CN;
Lichao Nie, Jinan, CN;
Shucai Li, Jinan, CN;
Zhiqiang Li, Jinan, CN;
Zhaoyang Deng, Jinan, CN;
Yuancheng Li, Jinan, CN;
Guoan Chu, Jinan, CN;
Shaoyang Dong, Jinan, CN;
SHANDONG UNIVERSITY, Jinan, CN;
Abstract
The present invention provides a full-decay induced polarization (FDIP) detection system and method for water inrush in tunnels, comprising: through instructions for controlling constant-current high-power transmitting module and multi-channel parallel data acquisition and receiving module, receiving observation data and performing inversion by replacing minimum gradient support constraint to traditional smooth constraint, introducing data shape as prior information into inversion objective function, and constructing and solving focusing inversion formula of FDIP detection for water inrush in tunnels based on data shape constraint, to update model parameters; completing multi-source information acquisition of apparent resistivity, polarizability and the like and multi-parameter inversion imaging of zero-frequency resistivity, relaxation time, chargeability and frequency correlation coefficient, effectively reduce electromagnetic interference and improve detection efficiency, greatly meet the urgent requirement for detecting sudden water inrush disaster sources in front of tunnel face under construction, and having strong research significance and application value.