The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2025
Filed:
Jan. 07, 2020
Lpe S.p.a., Baranzate, IT;
Denso Corporation, Aichi-Pref, JP;
Francesco Corea, Baranzate, IT;
Danilo Crippa, Baranzate, IT;
Maurilio Meschia, Baranzate, IT;
Yuichiro Tokuda, Aichi-Pref, JP;
LPE S.P.A., Baranzate, IT;
DENSO CORPORATION, Aichi-Pref, JP;
Abstract
The reaction chamber () is designed for a reactor () for deposition of layers of semiconductor material on substrates; it comprises a tube () and an injector () and a holder (); the tube () is made of quartz and has a cylindrical or prismatic shape and surrounds a reaction and deposition zone; the injector () is arranged to inject precursor gases into the reaction and deposition zone; the holder () is arranged to support a substrate in the reaction and deposition zone during deposition processes; graphite susceptor elements () are located inside the tube () for heating the reaction and deposition zone and components inside the reaction and deposition zone; an inductor system () is located outside the tube () for providing energy to the susceptor elements () by electromagnetic induction; a rotating element () in the form of a cylindrical or prismatic tube is located inside the reaction and deposition zone and surrounds the injector ().