The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2025
Filed:
Feb. 14, 2023
Gross-wen Technologies, Inc., Slater, IA (US);
Martin Gross, Boone, IA (US);
Zhiyou Wen, Ames, IA (US);
Xuefei Zhao, Ames, IA (US);
Max Thomas Gangestad, Boone, IA (US);
Gross-Wen Technologies, Inc., Slater, IA (US);
Abstract
A method of using algae to remove a contaminant or pollutant from a first fluid is provided. The method can include providing a growing apparatus having a first reservoir containing the first fluid and a second reservoir containing a second fluid, and growing the algae using the growing apparatus. The method can further include exposing the algae to the first fluid within the first reservoir where the algae uptakes the contaminant or pollutant from the first fluid, and exposing the algae via a belt to the second fluid in the second reservoir where the algae is stimulated to release the contaminant or pollutant. Exposing the algae to the first fluid within the first reservoir or the second fluid may change a growth rate of the algae.