The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2025
Filed:
May. 29, 2019
Atg Ceylon (Pvt) Limited, Katunayake, LK;
John Taylor, Telford, GB;
Mohamed Fazal Abdeen, B Colombo, LK;
Sunil Mendis, Gampaha, LK;
Andrew Goth, San Diego, CA (US);
ATG CEYLON (PVT) LIMITED, Katunayake, LK;
Abstract
A method of making a garment material and garment material and garments obtainable by the method. The method comprises providing a first layer, which is a shaped polymer and applying a liner to the first layer, the liner being formed of yarn and having interstices through it. A fluid polymeric material is then applied to the liner so that it permeates the interstices and is allowed to solidify to thereby form a second layer in which the liner is embedded in the solid polymeric material. Fibres are then applied to form a textile layer, which serves as a skin-contacting layer. The garment material comprises a first layer (), which is a shaped polymer; a second layer (), which is a shaped polymer that is provided at one or more locations on the first layer, the second layer taking the shape of the first layer at said one or more locations; and a textile layer (). The second layer is located between the first layer and the textile layer and a liner () is embedded in the second layer, the liner being formed of yarn and having interstices through it.