The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2025
Filed:
Mar. 16, 2020
Applicant:
Eth Zurich, Zürich, CH;
Inventors:
Assignee:
ETH ZURICH, Zürich, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01); G01N 15/14 (2006.01); H01J 49/04 (2006.01); H01J 49/10 (2006.01); G01N 15/10 (2006.01); G01N 15/149 (2024.01);
U.S. Cl.
CPC ...
H01J 49/105 (2013.01); G01N 15/14 (2013.01); H01J 49/0031 (2013.01); H01J 49/045 (2013.01); G01N 2015/1006 (2013.01); G01N 15/149 (2024.01);
Abstract
An ICP source () for generating ions using an inductively coupled plasma is configured to be coupled to a mass spectrometer (). The sample is introduced into the plasma along a downwards-pointing vertical direction (G) under the action of gravity. In this manner, the sample can reach the plasma regardless of its condition, e.g., regardless of droplet or particle size. Transport efficiencies of up to 100% can be achieved. The ICP source can be supplied with a continuous stream comprising the sample.
Quick Actions:
Hattendorf, Bodo. (2025). Ion source for inductively coupled plasma mass spectrometry (U.S. Patent No. 12368039). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12368039
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