The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2025
Filed:
Jul. 21, 2021
The Catholic University of Korea Industry—academic Cooperation Foundation, Seoul, KR;
Gil Medical Center, Incheon, KR;
Inha University Research and Business Foundation, Incheon, KR;
Min Jeong Wang, Seongnam-si, KR;
Dong Won Yang, Seoul, KR;
Sang Yun Kim, Seongnam-si, KR;
Kee Hyung Park, Incheon, KR;
Jee Hyang Jeong, Seoul, KR;
Seong Hye Choi, Incheon, KR;
Yun Jeong Hong, Uijeongbu-si, KR;
Min Jeong Wang, Seongnam-si, KR;
THE CATHOLIC UNIVERSITY OF KOREA INDUSTRY-ACADEMIC COOPERATION FOUNDATION, Seoul, KR;
[object Object];
GIL MEDICAL CENTER, Incheon, KR;
Inha University Research and Business Foundation, Incheon, KR;
Abstract
There is provided a method for determining dementia risk factors by a server using deep learning. In this instance, the method for determining dementia risk factors includes acquiring biometric information from each subject corresponding to a first control group through a wearable device, acquiring measurement information for each subject corresponding to the first control group, deriving a first dementia risk factor based on the biometric information and the measurement information for each subject, and deriving a second dementia risk factor related to the first dementia risk factor via deep learning performed based on the biometric information related to the first dementia risk factor and control group information.