The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2025

Filed:

Jul. 24, 2023
Applicant:

Unisantis Electronics Singapore Pte. Ltd., Singapore, SG;

Inventors:

Koji Sakui, Tokyo, JP;

Nozomu Harada, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 11/4076 (2006.01); G11C 11/4093 (2006.01); G11C 11/4096 (2006.01); G11C 16/04 (2006.01);
U.S. Cl.
CPC ...
G11C 11/4096 (2013.01); G11C 11/4076 (2013.01); G11C 11/4093 (2013.01); G11C 16/04 (2013.01); G11C 2211/4016 (2013.01);
Abstract

There is provided a columnar semiconductor memory device in which a data retention operation is performed in which voltages applied to a first gate conductor layer, a second gate conductor layer, a first impurity region, and a second impurity region are controlled to retain a group of positive holes, generated by an impact ionization phenomenon or a gate-induced drain leakage current, inside a semiconductor body, and a data erase operation is performed in which the voltages applied to the first gate conductor layer, the second gate conductor layer, the first impurity region, and the second impurity region are controlled to discharge the group of positive holes from inside the semiconductor body and the voltage of the semiconductor body is lowered with capacitive coupling with the first gate conductor layer and capacitive coupling with the second gate conductor layer.


Find Patent Forward Citations

Loading…