The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2025
Filed:
Sep. 02, 2021
Applicant:
Fujifilm Corporation, Tokyo, JP;
Inventor:
Tetsuya Kamimura, Shizuoka, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/40 (2006.01); G03F 7/32 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); G03F 7/322 (2013.01); H01L 21/0274 (2013.01);
Abstract
The present invention provides a chemical liquid having excellent residue removal performance, a rinsing solution, and a resist pattern forming method. The chemical liquid according to an embodiment of the present invention is a chemical liquid containing an alcohol-based solvent having a C log P value of more than −1.00 and 3.00 or less and a specific compound selected from the group consisting of a compound represented by Formula (1) and a compound represented by Formula (2), in which a content of the specific compound is 0.0010 to 10 ppb by mass with respect to a total mass of the chemical liquid.