The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2025
Filed:
Aug. 31, 2022
Applicant:
Semes Co., Ltd., Chungcheongnam-do, KR;
Inventors:
Hyo Won Yang, Seoul, KR;
Hyun Yoon, Gyeonggi-do, KR;
Ji Hoon Jeong, Gyeonggi-do, KR;
In Ki Jung, Gyeonggi-do, KR;
Ki Hoon Choi, Chungcheongnam-do, KR;
Tae Hee Kim, Gyeonggi-do, KR;
Se Hoon Oh, Chungcheongnam-do, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/72 (2012.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 1/72 (2013.01); G03F 7/70025 (2013.01); G03F 7/70558 (2013.01);
Abstract
A photomask correction method capable of increasing the photomask precision is provided. The photomask correction method comprises measuring an intensity profile of a laser, acquiring etching amount data corresponding to the measured intensity profile using a library, determining a process parameter of the laser based on the etching amount data, and correcting a photomask with the laser according to the determined process parameter.