The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2025
Filed:
Mar. 06, 2023
Colorado State University Research Foundation, Fort Collins, CO (US);
Ioannis Minas, Fort Collins, CO (US);
Colorado State University Research Foundation, Fort Collins, CO (US);
Abstract
The true impact of preharvest factors such as crop load, canopy position, cultivar and rootstock on peach internal quality can be determined using multivariate visible light radiation (Vis) and near infrared spectroscopy (NIRS) prediction models to non-destructively assess peach internal quality (dry matter content, DMC; soluble solids concentration, SSC) and maturity (index of absorbance difference, I). A novel crop load×fruit developmental stage protocol allowed accurate multivariate Vis-NIRS-based prediction models development for three major yellow fleshed peach typologies (fully red over-colored, early-ripening bi-colored and late-ripening bi-colored) to non-destructively assess peach internal quality (DMC and SSC) and maturity (I) with a single scan during fruit growth and development in the field. The impact of preharvest factors such as crop load and canopy position on peach quality and maturity can be evaluated across a variety of peach cultivars using this novel technology.