The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2025

Filed:

May. 28, 2020
Applicant:

National University Corporation Nagoya University, Nagoya, JP;

Inventors:

Toru Ujihara, Nagoya, JP;

Yukihisa Takeuchi, Nagoya, JP;

Mingyu Chen, Nagoya, JP;

Masashi Nagaya, Nagoya, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 5/14 (2006.01); C01B 21/072 (2006.01); C30B 25/00 (2006.01); C30B 29/38 (2006.01); C30B 29/62 (2006.01);
U.S. Cl.
CPC ...
C09K 5/14 (2013.01); C01B 21/072 (2013.01); C01B 21/0722 (2013.01); C30B 25/005 (2013.01); C30B 29/38 (2013.01); C30B 29/62 (2013.01); C01P 2002/72 (2013.01); C01P 2004/01 (2013.01); C01P 2004/03 (2013.01); C01P 2004/04 (2013.01); C01P 2004/16 (2013.01); C01P 2006/32 (2013.01);
Abstract

A method for producing AlN crystals includes using at least one element, excluding Si, that satisfies a condition under which the element forms a compound with neither Al nor N or a condition under which the element forms a compound with any of Al and N provided that the standard free energy of formation of the compound is larger than that of AlN; melting a composition containing at least Al and the element; and reacting the Al vapor with nitrogen gas at a predetermined reaction temperature to produce AlN crystals.


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