The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2025
Filed:
Aug. 18, 2021
Fujikura Ltd., Tokyo, JP;
Hiroyuki Yamagishi, Chiba, JP;
Fujikura Ltd., Tokyo, JP;
Abstract
A stereolithography device includes: a container that stores a photocurable resin before curing, the container having a bottom plate that is optically transparent; a holder configured to be immersed into the photocurable resin; a reaction light irradiation section configured to irradiate a reaction light that accelerates curing of the photocurable resin, wherein the reaction light passes through a boundary surface between the bottom plate and the photocurable resin; and an inhibition light irradiation section configured to irradiate an inhibition light that inhibits curing of the photocurable resin, wherein the inhibition light is totally reflected at the boundary surface.