The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2025
Filed:
Nov. 05, 2019
Applicant:
Eos Gmbh Electro Optical Systems, Krailling, DE;
Inventor:
Peter Holfelder, Neufahrn bei Freising, DE;
Assignee:
EOS GmbH Electro Optical Systems, Krailling, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22F 10/85 (2021.01); B22F 10/28 (2021.01); B22F 10/36 (2021.01); B22F 10/366 (2021.01); B22F 10/368 (2021.01); B22F 12/41 (2021.01); B22F 12/45 (2021.01); B22F 12/46 (2021.01); B22F 12/49 (2021.01); B22F 12/90 (2021.01); B33Y 10/00 (2015.01); B33Y 50/02 (2015.01);
U.S. Cl.
CPC ...
B22F 10/85 (2021.01); B22F 10/36 (2021.01); B22F 12/41 (2021.01); B33Y 10/00 (2014.12); B33Y 50/02 (2014.12); B22F 10/28 (2021.01); B22F 10/366 (2021.01); B22F 10/368 (2021.01); B22F 12/45 (2021.01); B22F 12/46 (2021.01); B22F 12/49 (2021.01); B22F 12/90 (2021.01);
Abstract
Disclosed is a method and device for generating additive manufacturing control data. The control data are generated such that the energy beam has an intensity distribution, at the area of incidence on the build field, in a see tion plane running perpendicularly to the beam axis of the energy beam, which intensity distribution