The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2025

Filed:

Mar. 12, 2024
Applicant:

Stryker Corporation, Kalamazoo, MI (US);

Inventors:

William Ross Heneveld, Jr., Portage, MI (US);

Chad Conway Souke, Vicksburg, MI (US);

Michael T. Brubaker, Portage, MI (US);

Mackenzie Van Loon, Mattawan, MI (US);

Assignee:

Stryker Corporation, Portage, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61G 7/10 (2006.01); A61G 1/02 (2006.01); A61G 1/056 (2006.01);
U.S. Cl.
CPC ...
A61G 7/1034 (2013.01); A61G 1/0262 (2013.01); A61G 1/0567 (2013.01); A61G 7/1001 (2013.01); A61G 7/1055 (2013.01); A61G 7/1057 (2013.01);
Abstract

A patient support apparatus supports a patient and includes a litter. A base is disposed below the litter. A lift mechanism is configured to move the litter and the base relative to one another between extended and collapsed positions. The lift mechanism includes first and second frame assemblies each including an outer frame member and an inner frame member arranged to move within the outer frame member. First and second rollers and first and second slide members are disposed between the outer and inner frame members. The first and second rollers are arranged to roll along at least one of the outer and inner frame members with a load exerted on the lift mechanism from the litter. The first and second slide members are arranged to slide along at least one of the outer and inner frame members with a load exerted on the lift mechanism from the base.


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